Evolution of arsenic in high fluence plasma immersion ion implanted silicon: behavior of the as-implanted dopant
| Categories |
Veröffentlichungen |
| Year | 2015 |
| Authors | V. Vishwanath, E. Demenev, D. Giubertoni, L. Vanzetti, A. L. Koh, G. Steinhauser, G. Pepponi, M. Bersani, F. Meirer, M. Foad |
| Published in | Applied Surface Science 355 (2015) 792-799 |
Description
| DOI | 10.1016/j.apsusc.2015.07.068 |
